SEMINAR: CMCA Seminar: Increasing the performance and analytical power of FIB-SEMs
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CMCA Seminar: Increasing the performance and analytical power of FIB-SEMs |
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Xe plasma FIBs or iFIBs offer extremely high material removal rates and very low contamination compared to conventional gallium FIBs. As such, Xe plasma FIBs have great potential in applications such as failure analysis and MEMS fabrication in the semiconductor industry as well as in generating large TEM samples and 3D tomography/EDS/EBSD datasets.
In this talk we will explain the advantages of Xe plasma FIBS from both a physico-chemical perspective and an efficiency perspective based on the physics of how they work and their performance.
Speaker(s) |
Antonin Doupal, TESCAN
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Location |
CMCA Seminar Room 1.80, Physics Building
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Contact |
Antonin Doupal
<[email protected]>
: 02 9450 1359
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Start |
Thu, 02 Mar 2017 15:00
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End |
Thu, 02 Mar 2017 16:00
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Submitted by |
CMCA Admin <[email protected]>
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Last Updated |
Tue, 14 Feb 2017 10:04
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